内容简介
Cutting-EdgeCMOSVLSIDesignforManufacturabilityTechniquesThisdetailedguideoffersprovenmethodsforoptimizingcircuitdesignstoincreasetheyield,reliability,andmanufacturabilityofproductsandmitigatedefectsandfailure.Coveringthelatestdevices,technologies,andprocesses,NanoscaleCMOSVLSICircuits:DesignforManufacturabilityfocusesondeliveringhigherperformanceandlowerpowerconsumption.Costs,constraints,andcomputationalefficienciesarealsodiscussedinthepracticalresource.NanoscaleCMOSVLSICircuitscovers:CurrenttrendsinCMOSVLSIdesignSemiconductormanufacturingtechnologiesPhotolithographyProcessanddevicevariability:analysesandmodelingManufacturing-AwarePhysicalDesignClosureMetrology,manufacturingdefects,anddefectextractionDefectimpactmodelingandyieldimprovementtechniquesPhysicaldesignandreliabilityDFMtoolsandmethodologies