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Springer手册精选系列·晶体生长手册(第2册):熔体法晶体生长技术(影印版)
作者
[美]
德哈纳拉
编[美]
德哈纳拉
编
出版社
哈尔滨工业大学出版社
出版时间
2013年1月 第1版
ISBN
9787560338675
定价
76.00
内容简介
《Springer手册精选系列·晶体生长手册(第2册):熔体法晶体生长技术(影印版)》介绍体材料晶体的熔体生长,一种生长大尺寸晶体的关键方法。这一部分阐述了直拉单晶工艺、泡生法、布里兹曼法、浮区熔融等工艺,以及这些方法的最新进展,例如应用磁场的晶体生长、生长轴的取向、增加底基和形状控制。本部分涉及材料从硅和Ⅲ-V族化合物到氧化物和氟化物的广泛内容。
作者简介
GovindhanDhanarajistheManagerofCrystalGrowthTechnologiesatAdvancedRenewableEnergyCompany(ARCEnergy)atNashua,NewHampshire(USA)focusingonthegrowthoflargesizesapphirecrystalsforLEDlightingapplications,characterizationandrelatedcrystalgrowthfurnacedevelopment.HereceivedhisPhDfromtheIndianInstituteofScience,BangaloreandhisMasterofSciencefromAnnaUniversity(India).Immediatelyafterhisdoctoraldegree,Dr.DhanarajjoinedaNationalLaboratory,presentlyknownasRajaramannaCenterforAdvancedTechnologyinIndia,whereheestablishedanadvancedCrystalGrowthLaboratoryforthegrowthofopticalandlasercrystals.PriortojoiningARCEnergy,Dr.DhanarajservedasaResearchProfessorattheDepartmentofMaterialsScienceandEngineering,StonyBrookUniversity,NY,andalsoheldapositionofResearchAssistantProfessoratHamptonUniversity,VA.Duringhis25yearsoffocusedexpertiseincrystalgrowthresearch,hehasdevelopedoptical,laserandsemiconductorbulkcrystalsandSiCepitaxialfilmsusingsolution,flux,Czochralski,Bridgeman,gelandvapormethods,andcharacterizedthemusingx-raytopography,synchrotrontopography,chemicaletchingandopticalandatomicforcemicroscopictechniques.Heco-organizedasymposiumonIndustrialCrystalGrowthunderthe17thAmericanConferenceonCrystalGrowthandEpitaxyinconjunctionwiththe14thUSBiennialWorkshoponOrganometallicVaporPhaseEpitaxyheldatLakeGeneva,WIin2009.Dr.Dhanarajhasdeliveredinvitedlecturesandalsoservedassessionchairmaninmanycrystalgrowthandmaterialssciencemeetings.Hehaspublishedover100papersandhisresearcharticleshaveattractedover250richcitations.
目录
丛书
Springer手册精选系列
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