书目
消息
首页
搜索
购物车
Springer手册精选系列·晶体生长手册(第5册):晶体生长模型及缺陷表征(影印版)
作者
[美]
德哈纳拉
编[美]
德哈纳拉
编
出版社
哈尔滨工业大学出版社
出版时间
2013年1月 第1版
ISBN
9787560338705
定价
76.00
内容简介
《Springer手册精选系列·晶体生长手册(第5册):晶体生长模型及缺陷表征(影印版)》介绍了生长工艺和缺陷形成的模型。这些章节验证了工艺参数和产生晶体质量问题包括缺陷形成的直接相互作用关系。随后的PartG展示了结晶材料特性和分析的发展。PartF和G说明了预测工具和分析技术在帮助高质量的大尺寸晶体生长工艺的设计和控制方面是非常好用的。
作者简介
GovindhanDhanarajistheManagerofCrystalGrowthTechnologiesatAdvancedRenewableEnergyCompany(ARCEnergy)atNashua,NewHampshire(USA)focusingonthegrowthoflargesizesapphirecrystalsforLEDlightingapplications,characterizationandrelatedcrystalgrowthfurnacedevelopment.HereceivedhisPhDfromtheIndianInstituteofScience,BangaloreandhisMasterofSciencefromAnnaUniversity(India).Immediatelyafterhisdoctoraldegree,Dr.DhanarajjoinedaNationalLaboratory,presentlyknownasRajaramannaCenterforAdvancedTechnologyinIndia,whereheestablishedanadvancedCrystalGrowthLaboratoryforthegrowthofopticalandlasercrystals.PriortojoiningARCEnergy,Dr.DhanarajservedasaResearchProfessorattheDepartmentofMaterialsScienceandEngineering,StonyBrookUniversity,NY,andalsoheldapositionofResearchAssistantProfessoratHamptonUniversity,VA.Duringhis25yearsoffocusedexpertiseincrystalgrowthresearch,hehasdevelopedoptical,laserandsemiconductorbulkcrystalsandSiCepitaxialfilmsusingsolution,flux,Czochralski,Bridgeman,gelandvapormethods,andcharacterizedthemusingx-raytopography,synchrotrontopography,chemicaletchingandopticalandatomicforcemicroscopictechniques.Heco-organizedasymposiumonIndustrialCrystalGrowthunderthe17thAmericanConferenceonCrystalGrowthandEpitaxyinconjunctionwiththe14thUSBiennialWorkshoponOrganometallicVaporPhaseEpitaxyheldatLakeGeneva,WIin2009.Dr.Dhanarajhasdeliveredinvitedlecturesandalsoservedassessionchairmaninmanycrystalgrowthandmaterialssciencemeetings.Hehaspublishedover100papersandhisresearcharticleshaveattractedover250richcitations.
目录
丛书
Springer手册精选系列
— END —