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Springer手册精选系列·晶体生长手册(第4册):蒸发及外延法晶体生长技术(影印版)
作者
[美]
德哈纳拉
编
出版社
哈尔滨工业大学出版社
出版时间
2013年1月 第1版
ISBN
9787560338699
定价
88.00
内容简介
《Springer手册精选系列·晶体生长手册(第4册):蒸发及外延法晶体生长技术(影印版)》的主题是气相生长。这一部分提供了碳化硅、氮化镓、氮化铝和有机半导体的气相生长的内容。随后的PartE是关于外延生长和薄膜的,主要包括从液相的化学气相淀积到脉冲激光和脉冲电子淀积。
作者简介
GovindhanDhanarajistheManagerofCrystalGrowthTechnologiesatAdvancedRenewableEnergyCompany(ARCEnergy)atNashua,NewHampshire(USA)focusingonthegrowthoflargesizesapphirecrystalsforLEDlightingapplications,characterizationandrelatedcrystalgrowthfurnacedevelopment.HereceivedhisPhDfromtheIndianInstituteofScience,BangaloreandhisMasterofSciencefromAnnaUniversity(India).Immediatelyafterhisdoctoraldegree,Dr.DhanarajjoinedaNationalLaboratory,presentlyknownasRajaramannaCenterforAdvancedTechnologyinIndia,whereheestablishedanadvancedCrystalGrowthLaboratoryforthegrowthofopticalandlasercrystals.PriortojoiningARCEnergy,Dr.DhanarajservedasaResearchProfessorattheDepartmentofMaterialsScienceandEngineering,StonyBrookUniversity,NY,andalsoheldapositionofResearchAssistantProfessoratHamptonUniversity,VA.Duringhis25yearsoffocusedexpertiseincrystalgrowthresearch,hehasdevelopedoptical,laserandsemiconductorbulkcrystalsandSiCepitaxialfilmsusingsolution,flux,Czochralski,Bridgeman,gelandvapormethods,andcharacterizedthemusingx-raytopography,synchrotrontopography,chemicaletchingandopticalandatomicforcemicroscopictechniques.Heco-organizedasymposiumonIndustrialCrystalGrowthunderthe17thAmericanConferenceonCrystalGrowthandEpitaxyinconjunctionwiththe14thUSBiennialWorkshoponOrganometallicVaporPhaseEpitaxyheldatLakeGeneva,WIin2009.Dr.Dhanarajhasdeliveredinvitedlecturesandalsoservedassessionchairmaninmanycrystalgrowthandmaterialssciencemeetings.Hehaspublishedover100papersandhisresearcharticleshaveattractedover250richcitations.
目录
丛书
Springer手册精选系列
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